 ผลงานตีพิมพ์ในวารสารวิชาการOrigin of Hole-Trapping States in Solution-Processed Copper(I) Thiocyanate and Defect-Healing by I2 Dopingผู้แต่ง: Worakajit, P., Kidkhunthod, P., Thanasarnsurapong, T., Waiprasoet, S., Nakajima, H., Sudyoadsuk, T., Promarak, V.,  Dr.ADISAK BOONCHUN, Associate Professor , Pattanasattayavong, P., วารสาร: 
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